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Quality Control of Beam Splitters and Quarter-Wave-Mirrors

Technical notes | 2020 | Agilent TechnologiesInstrumentation
NIR Spectroscopy, UV–VIS spectrophotometry
Industries
Materials Testing
Manufacturer
Agilent Technologies

Summary

Significance of the Topic


Optical coatings play a crucial role across research, aerospace, consumer electronics, and medical optics by precisely controlling reflection and transmission of light. High-quality multilayer stacks demand accurate layer thickness and refractive index data to achieve intended performance, especially at oblique angles of incidence. Traditional normal-incidence measurements often lack sufficient information, leading to ambiguity in reverse-engineering complex coatings.

Aims and Overview of the Study


This application note showcases the use of multi-angle UV-Vis-NIR spectroscopy with the Agilent Cary 7000 Universal Measurement Spectrophotometer (UMS) to perform quality control and reverse engineering of a 52-layer beam splitter and two 43-layer quarter-wave mirror stacks. The goal is to demonstrate enhanced measurement accuracy and optimized deposition strategies.

Methodology and Instrumentation


  • Sample Preparation
    • BS-AR-Suprasil beam splitter: 52 alternating Nb2O5/SiO2 layers on 1 mm Suprasil plus 10-layer AR on the rear surface.
    • HR800 quarter-wave mirrors: 43 HfO2/SiO2 layers on either 6.35 mm fused silica (HR800-FusedSilica) or 1 mm B260 glass (HR800-Glass).
  • Deposition Systems
    • Leybold Optics Helios magnetron sputtering for the beam splitter.
    • Leybold Optics SYRUSPro 710 e-beam evaporation for mirror stacks.
  • Measurement Setup
    • Cary 7000 UMS providing automated control of sample angle of incidence (–85° to +85°) and detector angles (–10° to +10°).
    • Variable-angle absolute specular reflectance and transmittance across UV-Vis-NIR spectra.
    • Polarization selection for both S and P measurements at each angle.
  • Data Analysis
    • Reverse engineering and model fitting using OptiLayer software to extract layer thicknesses and optical constants.


Main Results and Discussion


  • Beam Splitter
    • Multi-angle R and T measurements at 45° and 30° on the same surface area reduced uncertainty in layer thickness estimates.
    • Measured spectra agreed within 1% of theoretical OptiLayer predictions, validating reverse-engineering feedback for deposition tuning.
  • Quarter-Wave Mirrors
    • In-situ normal-incidence transmission data revealed wavelength shifts and band-width changes due to thickness calibration errors and a vacuum shift in HfO2 porosity.
    • Ex-situ Cary 7000 UMS data at 0°–45° in 5° increments, for both polarizations, highlighted deviations up to tens of nanometers, enabling refined model parameters.
    • Layer inhomogeneity and interdiffusion between HfO2 and SiO2 were incorporated as random index offsets and thickness variations for improved fit.


Benefits and Practical Applications


  • Automated, high-precision QA/QC of complex multilayer coatings without repositioning the sample.
  • Real-time process feedback combining in-situ and ex-situ data for adaptive coating control.
  • Reduced reverse-engineering ambiguity, enhanced yield, and consistent optical performance.


Future Trends and Applications


  • Integration of AI-driven modeling with multi-angle data for closed-loop deposition control.
  • Expansion to mid-IR and advanced polarization regimes, including graded-index and nanocomposite layers.
  • Automated in-situ monitoring combined with ex-situ validation for next-generation adaptive coatings.


Conclusion


The Agilent Cary 7000 UMS delivers comprehensive multi-angle spectrophotometric characterization, providing accurate reflectance and transmittance data at the same sample location. Coupled with reverse-engineering tools, it supports optimized coating designs, real-time process adaptation, and robust unattended QA/QC workflows for advanced optical applications.

Reference


  1. A.V. Tikhonravov et al., Appl. Opt. 51(2), 245–254 (2012).
  2. T.V. Amotchkina et al., Opt. Express 21(18), 21508–21522 (2013).
  3. D. Ristau et al., Proc. SPIE 7101, 71010C (2008).
  4. H.E. Ehlers et al., Chin. Opt. Lett. 8, 62–66 (2010).
  5. S.A. Furman and A.V. Tikhonravov, Basics of Optics of Multilayer Systems, Editions Frontieres (1992).
  6. O. Stenzel et al., Opt. Mater. Express 1(2), 278–292 (2011).

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